Novel Magnetic Properties Introduced by Ultra Clean Sputtering Process

MAGNETIC PROPERTIES OF AMORPHOUS Fe-Ti ALLOYS PRODUCED BY FACING TARGET TYPE SPUTTERING

In bulk FeTi alloys prepared by facing target type sputtering, an amorphous phase was obtained between 25 and 75 at% Ti. These alloys are weak itinerant electron ferromagnets and the Curie temperature decreases with increasing Ti concentration and becomes zero at about 60 at% Ti.

Microstructure and magnetic properties of very" thin CoCr films deposited on different underlayers by if-sputtering

Very thin CoCr films deposited on different underlayers on glass disk substrates were studied by the magneto-optic Kerr effect, VSM, torque magnetometcy and TEM selected area diffraction. Square or near square perpendicular loops were obtained from Co/Ti , CoCr/Au: CoCr/AI, CoCr/C and CoCr/Si films. TEM SAD study revealed that the crystalline structure is a key factor determining the magnetic a...

Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process

The optical, mechanical, and microstructural properties of MgF2 single layers grown by ion beam sputtering have been investigated by spectrophotometric measurements, film stress characterization, x-ray photoelectron spectroscopy ~XPS!, x-ray diffraction, and transmission electron microscopy. The deposition conditions, using fluorine reactive gas or not, have been found to greatly influence the ...

Ultra-Clean Freestanding Graphene by Platinum- Metal Catalysis

Magnetic properties of Er-doped ZnO films prepared by reactive magnetron sputtering

All Zn1−xErxO (x = 0.04, 0.05, and 0.17) films deposited on glass substrates by radio-frequency reactive magnetron sputtering exhibit the mixture of ferromagnetic and paramagnetic phases at room temperature. The estimated magnetic moment per Er ion decreases with the increase of Er concentration. The temperature dependence of the magnetization indicates that there is no intermetallic ErZn burie...